Description
Exercise 8.1
The high-frequency C−V characteristic curve of a MOS capacitor is shown in Figure 1. The area of the device is 2×10−3 cm2. The metal-semiconductor work function difference is ϕms = −0.50 V, the oxide is SiO2, the semiconductor is silicon, and the semiconductor doping concentration is 2 × 1016 cm−3.
- Is the semiconductor n or p type?
- What is the oxide thickness?
- What is the equivalent trapped oxide charge density?(d) Determine the flat-band capacitance.
Figure 1: Figure for Problem 8.1
Exercise 8.2
Consider the high-frequency C − V plot shown in Figure 2.
- Indicate which points correspond to flat-band, inversion, accumulation, threshold,and depletion modes.
- Sketch the energy-band diagram in the semiconductor for each condition.
Figure 2: Figure for Problem 8.2
Exercise 8.3
A p-channel MOSFET has the following parameters: = 15,
and VT = −0.4 V. Calculate the drain current ID for
- VSG = 0.8 V,VSD = 0.25 V;
- VSG = 0.8 V,VSD = 1.0 V ;
- VSG = 1.2 V,VSD = 1.0 V; (d) VSG = 1.2 V,VSD = 2.0 V.
Exercise 8.4
Consider a p-channel MOSFET with the following parameters: and W/L = 20. The drain current is 100µA with applied voltages of VSG = 0, VBS = 0, and
VSD = 1.0 V.
- Determine the VT
- Determine the drain current ID for VSG = 0.4 V,VSB = 0, and VSD = 1.5 V. (c) What is the value of ID for VSG = 0.6 V,VSB = 0, and VSD = 0.15 V?
Exercise 8.5
One curve of an n-channel MOSFET is characterized by the following parameters:
ID(sat) = 2 × 10−4 A,VDS( sat ) = 4 V, and VT = 0.8 V (a) What is the gate voltage?
- What is the value of the conduction parameter?
- If VG = 2 V and VDS = 2 V, determine ID.
- If VG = 3 V and VDS = 1 V, determine ID.
- For each of the conditions given in (c) and (d), sketch the inversion charge density and depletion region through the channel.
Exercise 8.6
An NMOS device has the following parameters: n+poly gate, tox = 400˚A,Na =
1015 cm−3, and cm−2.
- Determine VT.
- Is it possible to apply a VSB voltage such that VT = 0 ? If so, what is the value of VSB ?
Exercise 8.7
Draw the ID − VSD relationship for a p-type MOSFET at different gate voltages, assuming the source is grounded. Explain why there is the saturation region, and how the saturation point changes with different gate voltages.




